Oven Series

Highly specialized thermal processing systems designed to execute critical chemical and structural changes during wafer fabrication and advanced integrated circuit (IC) packaging.

Oxygen Free Oven

Single Chamber Oxygen free Oven

Applications

Traditional package Application equipment, Advanced package Application equipment

Technology

  • Temperature Max 500°C, Uniformity ± 3°C
  • Single Chamber / Dual Chamber / 4 Chamber / Customized
  • Equipped with HEPA, Class 100, Class 1000
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM
Dual Chamber Clean Oxygen free Oven

Applications

Traditional package Application equipment, Advanced package Application equipment

Technology

  • Temperature Max 500°C, Uniformity ± 3°C
  • Single Chamber / Dual Chamber / 4 Chamber / Customized
  • Equipped with HEPA, Class 100, Class 1000
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM
4 Chamber Automatic Oven
4 Chamber Automatic Oven

Applications

For Advanced package wafer & panel product, support OHT system

Technology

  • Temperature Max 300°C, Uniformity ± 3°C
  • Single Chamber / Dual Chamber / 4 Chamber / Customized
  • Equipped with HEPA, Class 100 Min
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM and AGV system

Applications

Traditional package Application equipment, Advanced package Application equipment

Technology

  • Temperature Max 500°C, Uniformity ± 3°C
  • Single Chamber / Dual Chamber / 4 Chamber / Customized
  • Equipped with HEPA, Class 100, Class 1000
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM

Oxygen Free Oven

Pressure/Vacuum Oven

Dual Chamber Pressure/Vacuum Oven

Applications

For Advanced package underfill, DAF tape Application process, support AGV system

Technology

  • Temperature Max 300°C, Uniformity ± 3°C (Fast temperature rise/drop)
  • Pressure capability Max 16kg, Vacuum capability ≤ 10 torr
  • Chamber diameter 600 / 700 / 900 mm
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM and AGV system
Auto Wafer Pressure:Vacuum Oven

Applications

For Advanced package wafer and panel product, support OHT system Load Port + EFEM + Auto pressure oven

Technology

  • Equipped with EFEM system (Wafer Transfer)
  • Temperature Max 300°C, Uniformity ± 3°C (Fast temperature rise/drop)
  • Pressure capability Max 16kg, Vacuum capability ≤ 20 torr
  • Chamber diameter 600 / 700 / 900 mm
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM and AGV system

Auto Wafer Clean Oven

Auto Wafer Clean Oven
Auto Wafer Clean Oven MF-AWO4300

Applications

For Advanced package wafer & panel product, support OHT system

Technology

  • Application 8–12 inch, thickness 500–800 µm, Warpage < ± 4 mm
  • Temperature Max 400°C, Uniformity ± 3°C
  • 25 pcs / Cassette, Total 4 Cassette
  • EFEM UNIT: Load Port 4 set / Robot / Align / Buffer area / Cooling area
  • Oxygen monitoring alarm prompt, equipped with oxygen content analyzer
  • Support SECS/GEM